New Structure Eliminates "Electron Traffic Jams" to Zero — KAIST Nullifies Semiconductor Contact Resistance with 2D Material

A Korean research team has developed a technology that eliminates contact resistance at the junction with metal electrodes by forming continuous semimetallic and semiconducting regions within a single platinum diselenide thin film. Atomic-level observation proves the absence of electron traffic jams, contributing to lower power consumption in next-generation chips.