テクノロジー
ASMLとImecが共同で「High NA EUV Lithography Lab」を開設、顧客の装置導入を支援
オランダのASMLとベルギーのImecは、次世代半導体の開発を加速させるため、ASMLのHigh NA EUVリソグラフィ装置（TWINSCAN EXE:5000）及び関連ツールへのアクセスを最先端のロジックおよびメモリ […]
Tech Product
High NA EUV Lithography Lab
Overview
The High NA EUV Lithography Lab is a collaborative facility established by ASML and Imec in Veldhoven, Netherlands. It provides leading semiconductor manufacturers with early access to the first High NA EUV scanners (TWINSCAN EXE:5000), allowing them to develop and de-risk manufacturing processes before the equipment is deployed in their own high-volume manufacturing facilities.