
テクノロジー
中国SMIC、EUV装置を使わず5nmプロセスの開発に成功、Huaweiに供給か
中国最大の半導体製造会社であり、HuaweiのパートナーであるSMIC(Semiconductor Manufacturing International Corporation)は、TSMCやSamsungらが用いてい […]
別名: self-aligned quadruple patterning
Self-Aligned Quadruple Patterning (SAQP) is a complex multi-patterning technique used in semiconductor fabrication to extend the resolution of lithography tools. By repeating deposition and etching steps, it allows for the creation of features four times denser than the initial lithographic pass, enabling the production of 7nm or 5nm chips using older DUV equipment.